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Loreal Absolut Repair Molecular leave in Mask 100ml

KSh 3,200.00

Experience the pinnacle of hair restoration with the L’Oréal Professionnel Absolut Repair Molecular Leave-In Mask (100ml), a professional-grade Intense Conditioning Product designed to repair hair at the molecular level. This scientific breakthrough works to rebond the hair’s internal structure, restoring strength, elasticity, and movement to even the most damaged strands. Its lightweight, creamy texture absorbs instantly, providing heat protection and a smooth, silky finish without any weighted residue.

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Description

The L’Oréal Absolut Repair Molecular Leave-in Mask is a cutting-edge treatment engineered for all damaged hair textures, including color-treated, lightened, and chemically processed hair. When hair is damaged, its molecular structure, composed of peptides, becomes compromised. Most traditional masks only coat the surface, but this patented formula decomposes peptides to inject their components back into the fiber. This 100ml professional leave-in not only protects the hair from external aggressors but also actively works to rebuild the hair’s internal strength, providing a visible transformation from the very first use.

Key Benefits

  • Molecular Inner Repair: Utilizing a Peptides Bonder and 5 Amino Acids, the formula penetrates deeply to reform and reinforce the hair’s molecular structure for long-lasting stability.

  • Instant Elasticity & Strength: Restores the natural bounce and flexibility of the hair, significantly reducing brittleness and the risk of future breakage.

  • High-Level Heat Protection: Acts as a professional shield against thermal damage from styling tools up to 230°C (450°F).

  • Superior Manageability: The fast-absorbing cream texture instantly detangles and smooths the cuticle, providing 48-hour frizz control and a soft, silk-like finish.

  • Professional Lightweight Formula: Designed to provide intense nourishment without weighing down the hair, ensuring your style maintains its natural body and movement.

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